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- W1988499062 abstract "We observed narrow-band voltage tunable far infrared emission from hot electrons in n-channel Si-Inversion layers due to radiative transitions between electric subbands. The radiation was generated by heating up the electron distribution in the inversion layer by applying a pulsed electric field E along the channel. From the E dependence of the subband emission together with the temperature and E dependence of the Shubnikov de Haas oscillations we obtained a measure of the hot electron temperature Te up to 40 V/cm. (Te−TL) shows an E2 dependence at small E (up to 3 V/cm) and approaches a linear dependence at large E." @default.
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- W1988499062 date "1978-01-01" @default.
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- W1988499062 title "Far infrared emission from hot electrons in Si-Inversion layers" @default.
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- W1988499062 doi "https://doi.org/10.1016/0038-1101(78)90127-2" @default.
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