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• W1989029081 endingPage "723" @default.
• W1989029081 startingPage "723" @default.
• W1989029081 abstract "Programmed rate chemical vapor deposition (PRCVD), in which conditions are systematically changed during deposition, studies of tungsten and aluminum are presented. In the tungsten study, PRCVD provided significantly greater throughput than conventional, constant rate CVD (CRCVD). We started the deposition process at a much higher rate then decreased the temperature during deposition. We achieved throughput increases of about a factor of three, with more improvement clearly obtainable. In addition to the increase in throughput, the properties of the PRCVD films were equal to, or superior to, CRCVD films. In the aluminum study, we demonstrated that PRCVD processes can yield films with better properties than CRCVD processes. PRCVD films can have higher nuclei densities, higher fractions of (111) orientated Al, lower surface roughnesses, higher reflectivities, and resistivities closer to that of bulk aluminum. For example, pulsing (starting and stopping) the precursor flow at the start of the temperature ramp down (−200 K/min) from 673 K (for 5 or 10 s), followed by deposition at 573 K yielded better films than similar traditional CRCVD processes. In general, PRCVD protocols provide degrees of freedom that can be used to improve processing or film properties. © 2000 The Electrochemical Society. All rights reserved." @default.
• W1989029081 created "2016-06-24" @default.
• W1989029081 creator A5004334580 @default.
• W1989029081 creator A5008252149 @default.
• W1989029081 creator A5018132067 @default.
• W1989029081 creator A5031622376 @default.
• W1989029081 creator A5046743307 @default.
• W1989029081 creator A5051899709 @default.
• W1989029081 creator A5063872231 @default.
• W1989029081 date "2000-01-01" @default.
• W1989029081 modified "2023-09-27" @default.
• W1989029081 title "Programmed Rate Chemical Vapor Deposition Protocols" @default.
• W1989029081 doi "https://doi.org/10.1149/1.1393259" @default.
• W1989029081 hasPublicationYear "2000" @default.
• W1989029081 type Work @default.
• W1989029081 sameAs 1989029081 @default.
• W1989029081 citedByCount "3" @default.
• W1989029081 crossrefType "journal-article" @default.
• W1989029081 hasAuthorship W1989029081A5004334580 @default.
• W1989029081 hasAuthorship W1989029081A5008252149 @default.
• W1989029081 hasAuthorship W1989029081A5018132067 @default.
• W1989029081 hasAuthorship W1989029081A5031622376 @default.
• W1989029081 hasAuthorship W1989029081A5046743307 @default.
• W1989029081 hasAuthorship W1989029081A5051899709 @default.
• W1989029081 hasAuthorship W1989029081A5063872231 @default.
• W1989029081 hasBestOaLocation W19890290811 @default.
• W1989029081 hasConcept C111548154 @default.
• W1989029081 hasConcept C113196181 @default.
• W1989029081 hasConcept C121332964 @default.
• W1989029081 hasConcept C127413603 @default.
• W1989029081 hasConcept C134121241 @default.
• W1989029081 hasConcept C147789679 @default.
• W1989029081 hasConcept C151730666 @default.
• W1989029081 hasConcept C157764524 @default.
• W1989029081 hasConcept C159985019 @default.
• W1989029081 hasConcept C171250308 @default.
• W1989029081 hasConcept C172120300 @default.
• W1989029081 hasConcept C17525397 @default.
• W1989029081 hasConcept C178790620 @default.
• W1989029081 hasConcept C183866003 @default.
• W1989029081 hasConcept C185592680 @default.
• W1989029081 hasConcept C19067145 @default.
• W1989029081 hasConcept C191897082 @default.
• W1989029081 hasConcept C192562407 @default.
• W1989029081 hasConcept C2816523 @default.
• W1989029081 hasConcept C41008148 @default.
• W1989029081 hasConcept C42360764 @default.
• W1989029081 hasConcept C513153333 @default.
• W1989029081 hasConcept C52859227 @default.
• W1989029081 hasConcept C542268612 @default.
• W1989029081 hasConcept C555944384 @default.
• W1989029081 hasConcept C57410435 @default.
• W1989029081 hasConcept C64297162 @default.
• W1989029081 hasConcept C75937256 @default.
• W1989029081 hasConcept C76155785 @default.
• W1989029081 hasConcept C86803240 @default.
• W1989029081 hasConcept C97355855 @default.
• W1989029081 hasConceptScore W1989029081C111548154 @default.
• W1989029081 hasConceptScore W1989029081C113196181 @default.
• W1989029081 hasConceptScore W1989029081C121332964 @default.
• W1989029081 hasConceptScore W1989029081C127413603 @default.
• W1989029081 hasConceptScore W1989029081C134121241 @default.
• W1989029081 hasConceptScore W1989029081C147789679 @default.
• W1989029081 hasConceptScore W1989029081C151730666 @default.
• W1989029081 hasConceptScore W1989029081C157764524 @default.
• W1989029081 hasConceptScore W1989029081C159985019 @default.
• W1989029081 hasConceptScore W1989029081C171250308 @default.
• W1989029081 hasConceptScore W1989029081C172120300 @default.
• W1989029081 hasConceptScore W1989029081C17525397 @default.
• W1989029081 hasConceptScore W1989029081C178790620 @default.
• W1989029081 hasConceptScore W1989029081C183866003 @default.
• W1989029081 hasConceptScore W1989029081C185592680 @default.
• W1989029081 hasConceptScore W1989029081C19067145 @default.
• W1989029081 hasConceptScore W1989029081C191897082 @default.
• W1989029081 hasConceptScore W1989029081C192562407 @default.
• W1989029081 hasConceptScore W1989029081C2816523 @default.
• W1989029081 hasConceptScore W1989029081C41008148 @default.
• W1989029081 hasConceptScore W1989029081C42360764 @default.
• W1989029081 hasConceptScore W1989029081C513153333 @default.
• W1989029081 hasConceptScore W1989029081C52859227 @default.
• W1989029081 hasConceptScore W1989029081C542268612 @default.
• W1989029081 hasConceptScore W1989029081C555944384 @default.
• W1989029081 hasConceptScore W1989029081C57410435 @default.
• W1989029081 hasConceptScore W1989029081C64297162 @default.
• W1989029081 hasConceptScore W1989029081C75937256 @default.
• W1989029081 hasConceptScore W1989029081C76155785 @default.
• W1989029081 hasConceptScore W1989029081C86803240 @default.
• W1989029081 hasConceptScore W1989029081C97355855 @default.
• W1989029081 hasIssue "2" @default.
• W1989029081 hasLocation W19890290811 @default.
• W1989029081 hasOpenAccess W1989029081 @default.
• W1989029081 hasPrimaryLocation W19890290811 @default.
• W1989029081 hasRelatedWork W1594126536 @default.
• W1989029081 hasRelatedWork W2001419146 @default.
• W1989029081 hasRelatedWork W2018819617 @default.
• W1989029081 hasRelatedWork W2070879465 @default.
• W1989029081 hasRelatedWork W2159205675 @default.
• W1989029081 hasRelatedWork W2363928588 @default.

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