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- W1989041337 abstract "A dopant-free channel metal-oxide-semiconductor field-effect transistor (MOSFET) featuring the punchthrough control region of moderate dopant concentrations under the source and the drain is proposed. This device structure is based on a new concept that the channel contains no appreciable ionized dopants at which electric field lines originating from the drain terminate whereas field lines from the drain mainly terminate at ionized dopants in the punchthrough control under the drain. The two-dimensional simulation analysis suggests that this device has good punchthrough control and consequently can be scaled down to 0.05 µm gate length. In this device, punchthrough can be suppressed by controlling the fringe effect of the pn junction formed between the drain and the punchthrough control." @default.
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- W1989041337 date "1994-08-01" @default.
- W1989041337 modified "2023-09-23" @default.
- W1989041337 title "Dopant-Free Channel Transistor with Punchthrough Control Region under Source and Drain" @default.
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- W1989041337 doi "https://doi.org/10.1143/jjap.33.l1066" @default.
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