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• W1989448592 abstract "Due to their unique physical and chemical properties, vanadium oxide thin films have become a hot research topic. In the present work, Vanadium oxide thin films were prepared by DC reactive magnetron sputtering at different oxygen partial pressure and thermally annealed in Ar atmosphere at 500°C for 2 hours. The microstructure, transmittance, optical band gap, resistivity, and temperature coefficient resistance (TCR) were measured. The results suggest that increasing of oxygen partial pressure can obviously improve the optical and electric properties" @default.
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• W1989448592 date "2012-06-01" @default.
• W1989448592 modified "2023-09-23" @default.
• W1989448592 title "Properties of Vanadium Oxide Films Prepared by DC Reactive Magnetron Sputtering at Different Oxygen Partial Pressures" @default.
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• W1989448592 doi "https://doi.org/10.4028/www.scientific.net/amr.538-541.105" @default.
• W1989448592 hasPublicationYear "2012" @default.
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