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Matches in SemOpenAlex for { <https://semopenalex.org/work/W1989647582> ?p ?o ?g. }

• W1989647582 endingPage "1695" @default.
• W1989647582 startingPage "1686" @default.
• W1989647582 abstract "Surface rich in covalently-bonded amine groups have wide end use applications in biomaterials. This article describes functionalization of stainless steel (SS) surface with reactive chemical groups using RF-cold-plasma polymerization of ethylene diamine (ED), acrylonitrile (AN), and acetonitrile (AcN). The effect of RF plasma power and frequency (40 kHz and 13.56 MHz) on surface chemistry was investigated by electron spectroscopy for chemical analysis (ESCA) and FTIR. It was demonstrated that all the plasma-deposited films consist of secondary and tertiary amines, imines, and amides with a small concentration of nitrile groups present in AN plasma. Significant changes in ED, and AN plasma-induced molecular fragmentation occur as the plasma conditions are varied. However, AcN plasma polymer chemistry is observed to be independent of RF frequency. Films deposited at 13.56 MHz RF power in continuous mode have higher concentrations of CN linkages, with maximum in ED plasma-polymerized films. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci, 2008" @default.
• W1989647582 created "2016-06-24" @default.
• W1989647582 creator A5004049535 @default.
• W1989647582 creator A5057695078 @default.
• W1989647582 creator A5063021923 @default.
• W1989647582 creator A5079480291 @default.
• W1989647582 date "2007-01-01" @default.
• W1989647582 modified "2023-10-09" @default.
• W1989647582 title "Surface functionalization by RF plasma deposition of ethylene diamine, acrylonitrile, and acetonitrile" @default.
• W1989647582 cites W1971486732 @default.
• W1989647582 cites W1974635589 @default.
• W1989647582 cites W1982441537 @default.
• W1989647582 cites W1995215975 @default.
• W1989647582 cites W1996015513 @default.
• W1989647582 cites W2007430881 @default.
• W1989647582 cites W2009197743 @default.
• W1989647582 cites W2011509907 @default.
• W1989647582 cites W2015320595 @default.
• W1989647582 cites W2019836687 @default.
• W1989647582 cites W2035710711 @default.
• W1989647582 cites W2036422061 @default.
• W1989647582 cites W2039192211 @default.
• W1989647582 cites W2050012651 @default.
• W1989647582 cites W2069318256 @default.
• W1989647582 cites W2090595347 @default.
• W1989647582 cites W2109339329 @default.
• W1989647582 cites W2125581788 @default.
• W1989647582 cites W2141296970 @default.
• W1989647582 cites W2143599551 @default.
• W1989647582 cites W2162963173 @default.
• W1989647582 cites W2164370375 @default.
• W1989647582 cites W2488826789 @default.
• W1989647582 cites W56842264 @default.
• W1989647582 doi "https://doi.org/10.1002/app.27189" @default.
• W1989647582 hasPublicationYear "2007" @default.
• W1989647582 type Work @default.
• W1989647582 sameAs 1989647582 @default.
• W1989647582 citedByCount "12" @default.
• W1989647582 countsByYear W19896475822012 @default.
• W1989647582 countsByYear W19896475822013 @default.
• W1989647582 countsByYear W19896475822015 @default.
• W1989647582 countsByYear W19896475822016 @default.
• W1989647582 countsByYear W19896475822019 @default.
• W1989647582 crossrefType "journal-article" @default.
• W1989647582 hasAuthorship W1989647582A5004049535 @default.
• W1989647582 hasAuthorship W1989647582A5057695078 @default.
• W1989647582 hasAuthorship W1989647582A5063021923 @default.
• W1989647582 hasAuthorship W1989647582A5079480291 @default.
• W1989647582 hasConcept C115537861 @default.
• W1989647582 hasConcept C115545448 @default.
• W1989647582 hasConcept C127413603 @default.
• W1989647582 hasConcept C147789679 @default.
• W1989647582 hasConcept C15920480 @default.
• W1989647582 hasConcept C178790620 @default.
• W1989647582 hasConcept C185592680 @default.
• W1989647582 hasConcept C188027245 @default.
• W1989647582 hasConcept C192562407 @default.
• W1989647582 hasConcept C2777463227 @default.
• W1989647582 hasConcept C2778372188 @default.
• W1989647582 hasConcept C2779240715 @default.
• W1989647582 hasConcept C2780871995 @default.
• W1989647582 hasConcept C42360764 @default.
• W1989647582 hasConcept C44228677 @default.
• W1989647582 hasConcept C521977710 @default.
• W1989647582 hasConceptScore W1989647582C115537861 @default.
• W1989647582 hasConceptScore W1989647582C115545448 @default.
• W1989647582 hasConceptScore W1989647582C127413603 @default.
• W1989647582 hasConceptScore W1989647582C147789679 @default.
• W1989647582 hasConceptScore W1989647582C15920480 @default.
• W1989647582 hasConceptScore W1989647582C178790620 @default.
• W1989647582 hasConceptScore W1989647582C185592680 @default.
• W1989647582 hasConceptScore W1989647582C188027245 @default.
• W1989647582 hasConceptScore W1989647582C192562407 @default.
• W1989647582 hasConceptScore W1989647582C2777463227 @default.
• W1989647582 hasConceptScore W1989647582C2778372188 @default.
• W1989647582 hasConceptScore W1989647582C2779240715 @default.
• W1989647582 hasConceptScore W1989647582C2780871995 @default.
• W1989647582 hasConceptScore W1989647582C42360764 @default.
• W1989647582 hasConceptScore W1989647582C44228677 @default.
• W1989647582 hasConceptScore W1989647582C521977710 @default.
• W1989647582 hasIssue "3" @default.
• W1989647582 hasLocation W19896475821 @default.
• W1989647582 hasOpenAccess W1989647582 @default.
• W1989647582 hasPrimaryLocation W19896475821 @default.
• W1989647582 hasRelatedWork W1594920453 @default.
• W1989647582 hasRelatedWork W1993031118 @default.
• W1989647582 hasRelatedWork W2042884948 @default.
• W1989647582 hasRelatedWork W2053186628 @default.
• W1989647582 hasRelatedWork W2244340227 @default.
• W1989647582 hasRelatedWork W2335653036 @default.
• W1989647582 hasRelatedWork W2346093580 @default.
• W1989647582 hasRelatedWork W2949071768 @default.
• W1989647582 hasRelatedWork W2952689057 @default.
• W1989647582 hasRelatedWork W870345692 @default.
• W1989647582 hasVolume "107" @default.
• W1989647582 isParatext "false" @default.
• W1989647582 isRetracted "false" @default.
• W1989647582 magId "1989647582" @default.

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