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- W1989721285 abstract "Carbon-free silicon dioxide has been deposited at room temperature by injection of pure hexamethyldisiloxane (HMDSO) into an atmospheric pressure microplasma jet from argon. At low HMDSO flow rates [<0.1SCCM (SCCM denotes cubic centimeter per minute at STP)], the SiOxHz films contain no carbon and exhibit an oxygen to silicon ratio close to 2 according to x-ray photoelectron spectroscopy. At high HMDSO flow rates (>0.1SCCM), SiOxCyHz films with a carbon content of up to 21% are obtained. The transition between organic to inorganic film is confirmed by Fourier transformed infrared spectroscopy. The deposition of inorganic films without oxygen admixture is explained by an ion-induced polymerization scheme of HMDSO." @default.
- W1989721285 created "2016-06-24" @default.
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- W1989721285 date "2008-03-03" @default.
- W1989721285 modified "2023-09-29" @default.
- W1989721285 title "Deposition of carbon-free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet" @default.
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- W1989721285 doi "https://doi.org/10.1063/1.2844880" @default.
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