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- W1990218084 abstract "The resolution of several methods for thin film thickness measurement using PIXE, based on the variation of the proton beam incident energy, is discussed. In order to evaluate the resolution, sputtering of copper films, deposited on aluminum and titanium substrates by argon ions is used. Sputtering yields are obtained through thickness changes, and then compared to other experimental and theoretical values. Good agreement is found, thus confirming the accuracy of PIXE as a method for film thickness determination." @default.
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- W1990218084 date "1991-01-01" @default.
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- W1990218084 title "RESOLUTION IN PIXE THIN FILM THICKNESS DETERMINATION" @default.
- W1990218084 doi "https://doi.org/10.1142/s0129083591000184" @default.
- W1990218084 hasPublicationYear "1991" @default.
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