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- W1990220879 abstract "A new method of ultralow optical absorption measurement based on the photothermal deflection effect is reported. An increase in sensitivity up to 4 orders of magnitude in comparison to a conventional transverse photothermal deflection method is achieved by placing the sample inside a high quality laser resonator. The method is realized for a diode laser pump emitting at 687 nm and an amorphous silicon (a-Si:H) sample of 1 μm thickness, using the air as a deflecting medium. The advantages of the method are discussed." @default.
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- W1990220879 date "1996-05-01" @default.
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- W1990220879 title "Intracavity photothermal measurements of ultralow absorption" @default.
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- W1990220879 doi "https://doi.org/10.1016/0022-3093(95)00649-4" @default.
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