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- W1990366989 abstract "A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22microC/cm2 and 0.33microC/cm2." @default.
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- W1990366989 date "2002-07-15" @default.
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- W1990366989 title "High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography" @default.
- W1990366989 doi "https://doi.org/10.1364/oe.10.000586" @default.
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