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- W1990403731 abstract "The reactive-sputtered polycrystalline Ti1 − xCrxN films with 0.17 ≤ x ≤ 0.51 are ferromagnetic and at x = 0.47 the Curie temperature TC shows a maximum of ~ 120 K. The films are metallic at 0 ≤ x ≤ 0.47, while the films with x = 0.51 and 0.78 are semiconducting-like. The upturn of resistivity below 70 K observed in the films with 0.10 ≤ x ≤ 0.47 is from the effects of the electron–electron interaction and weak localization. The negative magnetoresistance (MR) of the films with 0.10 ≤ x ≤ 0.51 is dominated by the double-exchange interaction, while at x = 0.78, MR is related to the localized magnetic moment scattering at the grain boundaries. The scaling ρxyA/n ∝ ρxx2.19 suggests that the anomalous Hall effect in the polycrystalline Ti1 − xCrxN films is scattering-independent." @default.
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- W1990403731 date "2013-09-01" @default.
- W1990403731 modified "2023-09-23" @default.
- W1990403731 title "Magnetoresistance and anomalous Hall effect of reactive sputtered polycrystalline Ti1−xCrxN films" @default.
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- W1990403731 doi "https://doi.org/10.1016/j.tsf.2013.06.068" @default.
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