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- W1990477890 abstract "The structure of [(Si${)}_{mathit{m}}$/(Ge${)}_{mathit{n}}$${]}_{mathit{p}}$ superlattice interfaces and the onset of relaxation and interdiffusion initiated by annealing have been investigated with the use of extended x-ray-absorption fine structure and Raman scattering. For the as-grown material, the Ge-Ge bond length (0.2409 nm) was equal to that calculated for a fully strained Ge layer (0.2412 nm) while the Si-Ge bond length was significantly shorter. The results show conclusively that substantial intermixing along with partial relaxation of the Ge-Ge bonds occurs even for the shortest anneal at 700 ifmmode^circelsetextdegreefi{}C." @default.
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- W1990477890 date "1992-06-15" @default.
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- W1990477890 title "Thermal stability of the [(Si<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow><mml:mo>)</mml:mo></mml:mrow><mml:mrow><mml:mi mathvariant=italic>m</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math>/(Ge<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow><mml:mo>)</mml:mo></mml:mrow><mml:mrow><mml:mi mathvariant=italic>n</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math …" @default.
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- W1990477890 doi "https://doi.org/10.1103/physrevb.45.13591" @default.
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