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- W1991035722 abstract "ABSTRACT We investigated the defect printability of hole patterns in electron projection lithography (EPL) using a diamond reticlewith a programmed defect pattern. The reticle was fabricated by NTT-AT and wafer exposure was performed using Nikon'sEB projection experimental column. We simulated the defect printability to understand in greater detail. We found that themask error enhancement factor (MEF) of the size shift defect category exceeded the value of one and was degraded by theamount of beam blur. On the other hand, the printability of the dot defect category was lower than the shift category. Inparticular, pin hole defects smaller than 100 nm were not printed.However the defect types of under size shift, truncation, edge intrusion, and corner intrusion (they decreased the openingarea), actually increased the defect size because the defect was too small for hole patterns to print.In general, the defect printability of hole patterns depends on the beam blur, and the printed error size at the hole patternsgetting larger than the line patterns. We have to pay closer attention to the hole pattern defect than to the line patterns.Keywords: electron projection lithography, stencil reticle, defect, printability, inspection, hole pattern" @default.
- W1991035722 created "2016-06-24" @default.
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- W1991035722 date "2003-06-13" @default.
- W1991035722 modified "2023-09-23" @default.
- W1991035722 title "Defect printability of hole pattern on electron projection lithography" @default.
- W1991035722 doi "https://doi.org/10.1117/12.484976" @default.
- W1991035722 hasPublicationYear "2003" @default.
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