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- W1991119883 abstract "We are describing a method of measuring thickness of a native silicon dioxide film using a scanning electronmicroscope. The method consists of etch removal of native silicon dioxide from the surface of trenches in silicon with aright-angled profile, with a subsequent measurement of an increase in trench width. The thickness of a native silicondioxide film measured with the help of this method turned out to be 2.39 ± 0.12 nm." @default.
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- W1991119883 date "2009-08-20" @default.
- W1991119883 modified "2023-09-23" @default.
- W1991119883 title "Measurement of thickness of native silicon dioxide with a scanning electron microscope" @default.
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- W1991119883 doi "https://doi.org/10.1117/12.826190" @default.
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