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• W1991137112 abstract "A process is developed for the fabrication of vertically arranged poly-silicon nanowires via a rigorously top-down batch process. The technique allows the production of wire arrays with larger linear density (projected on the surface) than those achievable with any of the other proposed top-down processes." @default.
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• W1991137112 date "2011-06-01" @default.
• W1991137112 modified "2023-09-27" @default.
• W1991137112 title "Ultradense silicon nanowire arrays produced via top-down planar technology" @default.
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• W1991137112 doi "https://doi.org/10.1016/j.mee.2010.11.034" @default.
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