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- W1991448747 abstract "We examined the effect of the molecular weight of surfactants in ceria slurry during chemical mechanical polishing (CMP) for shallow trench isolation (STI). We found that for a surfactant with a higher molecular weight, the oxide removal rate decreased drastically as the surfactant concentration increased, but in the case of a lower molecular weight, it only slightly decreased. In addition, slurries whose surfactants had lower molecular weights maintained a higher nitride removal rate with increasing surfactant concentration. The results showed that the molecular weight and surfactant concentration have complex effects on the oxide removal rate and the oxide-to-nitride removal selectivity." @default.
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- W1991448747 date "2004-07-23" @default.
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- W1991448747 title "Effect of Molecular Weight of Surfactant in Nano Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing (CMP)" @default.
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- W1991448747 doi "https://doi.org/10.1143/jjap.43.l1060" @default.
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