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• W1991451146 abstract "Herein we demonstrate how the photoreaction between anthracenes and singlet oxygen (1O2) is employed for applications either as photoswitch or as photoresist. Thin films of the diaryl−alkyl anthracene 1 and the analogous oligomeric species 2 were irradiated under photomasks to generate pattern structures composed of 1/1-O2 and 2/2-O2. Kelvin probe force microscopy (KPFM) provided a powerful and nondestructive method to image the pattern information. The following studies based on AFM, KPFM and contact angle measurements unfold that the two species 1 and 2 underwent different progressions after the imaging step. Degrading is observed for the monomeric compound 1 and the pattern eventually becomes recognizable in topography. In the oxidized state (1-O2) the monomeric species remains physically stable. In consequence, the unreacted portion is removable and the remaining oxygenated form 1-O2 is sufficiently stable to protect an underlying substrate (e.g., silver) from etching. Thus, the system 1/1-O2 operates as photoresist. On the other hand, both states of the oligomer 2 remain stable. The film is stable up to temperatures >120 °C required to erase the pattern within acceptable time by cycloreversion. Anthracene 2 therefore acts as erasable and rewritable photochromic switch. The different behavior between 1 and 2 is explained by phase transitions which cause crystallization and finally ablation. Such transitions affect only the monomeric system 1/1-O2 and not the oligomeric system 2/2-O2. In conclusion, we designed two very similar materials based on diarylanthracenes, which can act either as a photoresist or as a rewritable photochromic switch." @default.
• W1991451146 created "2016-06-24" @default.
• W1991451146 creator A5010410372 @default.
• W1991451146 creator A5078819465 @default.
• W1991451146 date "2010-01-07" @default.
• W1991451146 modified "2023-10-07" @default.
• W1991451146 title "Novel Anthracene Materials for Applications in Lithography and Reversible Photoswitching by Light and Air" @default.
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• W1991451146 doi "https://doi.org/10.1021/la904299n" @default.
• W1991451146 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/20052984" @default.
• W1991451146 hasPublicationYear "2010" @default.
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