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• W1991583993 abstract "The near surface structure of low energy (0.5-1.5 keV) argon bombarded Si(100) was characterized using medium energy ion scattering and high resolution X-ray photoemission spectroscopy. The ion induced lattice damage, distribution and redistribution of incorporated argon and silicon carbide formed during the dynamic mixing process are directly and non-destructively measured and depth-profiled in the sub-nanometre scale. The results capture many details of low energy ion interaction with Si in the near surface and address the capability for direct and non-destructive characterization of such interactions in the sub-nanometre scale." @default.
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• W1991583993 date "1995-12-01" @default.
• W1991583993 modified "2023-10-06" @default.
• W1991583993 title "Characterization of Si(100) sputtered with low energy argon" @default.
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• W1991583993 doi "https://doi.org/10.1016/0168-583x(95)00673-7" @default.
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