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- W1991750863 abstract "In the field of micromachining dry etching processes of silicon are getting more and more important in view of applications. By means of RIE processes it is possible to achieve structures with a very high aspect ratio. This is interesting especially in comparison with the well known but expensive LIGA technique. Unfortunately the anisotropy of the profile in silicon depends strongly on different process conditions. Therefore experiments were carried out with variations in the gas composition, the plasma power and the mask materials. All investigations were made in a 310-type machine from STS. The gas composition was made of SF<SUB>6</SUB>, O<SUB>2</SUB> and CHF<SUB>3</SUB>. The flow rate of these gases was varied in a wide range. The power of the plasma was hanged from 75W up to 600W at a frequency of 13,56MHz. Aluminium, copper, nickel and chromium were used as masking materials. The width of the patterns was in a range of > 20 micrometers. In contradiction to results known from literature it was not simple to achieve structures with vertical sidewalls. Using aluminium as materials, the sidewalls were rounded independent of the power and the composition of the gas. In some cases a small redeposition was observable at the bottom of the structures. A kind of microgas was observed, too. Copper showed high etch rates in some gas compositions and at defined power conditions. Therefore a complete removing of the masking layer was observed in some cases. Some material was redeposited in the transition zone between the sidewalls and the bottom. The structures showed rounded edges and no vertical sidewalls. A higher redeposition rate was found using nickel as masking material. Unfortunately this redeposition occurred at the bottom of the structures. This is measurable in a decrease of the etch rate. The structures are rounded with a kind of vertical sidewalls. Anisotropic structures with vertical sidewalls were observed with chromium as mask layer. The anisotropic etch behavior with a high aspect ratio was achieved only in a small range of the gas composition and the plasma power." @default.
- W1991750863 created "2016-06-24" @default.
- W1991750863 creator A5010173841 @default.
- W1991750863 creator A5039196737 @default.
- W1991750863 creator A5063384999 @default.
- W1991750863 creator A5075425858 @default.
- W1991750863 date "1996-09-23" @default.
- W1991750863 modified "2023-10-03" @default.
- W1991750863 title "<title>Influence of gas composition and the mask materials on the etch profile of dry-etched structures in silicon</title>" @default.
- W1991750863 doi "https://doi.org/10.1117/12.251236" @default.
- W1991750863 hasPublicationYear "1996" @default.
- W1991750863 type Work @default.
- W1991750863 sameAs 1991750863 @default.
- W1991750863 citedByCount "4" @default.
- W1991750863 countsByYear W19917508632012 @default.
- W1991750863 countsByYear W19917508632013 @default.
- W1991750863 crossrefType "proceedings-article" @default.
- W1991750863 hasAuthorship W1991750863A5010173841 @default.
- W1991750863 hasAuthorship W1991750863A5039196737 @default.
- W1991750863 hasAuthorship W1991750863A5063384999 @default.
- W1991750863 hasAuthorship W1991750863A5075425858 @default.
- W1991750863 hasConcept C100460472 @default.
- W1991750863 hasConcept C107187091 @default.
- W1991750863 hasConcept C121332964 @default.
- W1991750863 hasConcept C1291036 @default.
- W1991750863 hasConcept C130472188 @default.
- W1991750863 hasConcept C136525101 @default.
- W1991750863 hasConcept C142362112 @default.
- W1991750863 hasConcept C142724271 @default.
- W1991750863 hasConcept C145667562 @default.
- W1991750863 hasConcept C153349607 @default.
- W1991750863 hasConcept C159985019 @default.
- W1991750863 hasConcept C175721412 @default.
- W1991750863 hasConcept C187937830 @default.
- W1991750863 hasConcept C191897082 @default.
- W1991750863 hasConcept C192562407 @default.
- W1991750863 hasConcept C204787440 @default.
- W1991750863 hasConcept C2777402240 @default.
- W1991750863 hasConcept C2779227376 @default.
- W1991750863 hasConcept C49040817 @default.
- W1991750863 hasConcept C513153333 @default.
- W1991750863 hasConcept C544778455 @default.
- W1991750863 hasConcept C544956773 @default.
- W1991750863 hasConcept C62520636 @default.
- W1991750863 hasConcept C71924100 @default.
- W1991750863 hasConcept C82706917 @default.
- W1991750863 hasConcept C97355855 @default.
- W1991750863 hasConceptScore W1991750863C100460472 @default.
- W1991750863 hasConceptScore W1991750863C107187091 @default.
- W1991750863 hasConceptScore W1991750863C121332964 @default.
- W1991750863 hasConceptScore W1991750863C1291036 @default.
- W1991750863 hasConceptScore W1991750863C130472188 @default.
- W1991750863 hasConceptScore W1991750863C136525101 @default.
- W1991750863 hasConceptScore W1991750863C142362112 @default.
- W1991750863 hasConceptScore W1991750863C142724271 @default.
- W1991750863 hasConceptScore W1991750863C145667562 @default.
- W1991750863 hasConceptScore W1991750863C153349607 @default.
- W1991750863 hasConceptScore W1991750863C159985019 @default.
- W1991750863 hasConceptScore W1991750863C175721412 @default.
- W1991750863 hasConceptScore W1991750863C187937830 @default.
- W1991750863 hasConceptScore W1991750863C191897082 @default.
- W1991750863 hasConceptScore W1991750863C192562407 @default.
- W1991750863 hasConceptScore W1991750863C204787440 @default.
- W1991750863 hasConceptScore W1991750863C2777402240 @default.
- W1991750863 hasConceptScore W1991750863C2779227376 @default.
- W1991750863 hasConceptScore W1991750863C49040817 @default.
- W1991750863 hasConceptScore W1991750863C513153333 @default.
- W1991750863 hasConceptScore W1991750863C544778455 @default.
- W1991750863 hasConceptScore W1991750863C544956773 @default.
- W1991750863 hasConceptScore W1991750863C62520636 @default.
- W1991750863 hasConceptScore W1991750863C71924100 @default.
- W1991750863 hasConceptScore W1991750863C82706917 @default.
- W1991750863 hasConceptScore W1991750863C97355855 @default.
- W1991750863 hasLocation W19917508631 @default.
- W1991750863 hasOpenAccess W1991750863 @default.
- W1991750863 hasPrimaryLocation W19917508631 @default.
- W1991750863 hasRelatedWork W1584171941 @default.
- W1991750863 hasRelatedWork W1672156540 @default.
- W1991750863 hasRelatedWork W1991750863 @default.
- W1991750863 hasRelatedWork W2082964255 @default.
- W1991750863 hasRelatedWork W2089600663 @default.
- W1991750863 hasRelatedWork W2095490400 @default.
- W1991750863 hasRelatedWork W2139606557 @default.
- W1991750863 hasRelatedWork W2164353131 @default.
- W1991750863 hasRelatedWork W2748603911 @default.
- W1991750863 hasRelatedWork W820049253 @default.
- W1991750863 isParatext "false" @default.
- W1991750863 isRetracted "false" @default.
- W1991750863 magId "1991750863" @default.
- W1991750863 workType "article" @default.