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• W1991753814 abstract "We reported the replication of sub-100nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50nm. The polymeric soft molds for the NIL were fabricated by casting toluene diluted poly(dimethyl-siloxane) (PDMS) on the hydrogensilsesquioxane (HSQ) hard mold. The NIL results were characterized by using a scanning electron microscope and an atomic force microscope. Our results illustrate that, with the epoxy siloxane resist, the 50nm HSQ features on the hard mold can be successfully replicated using PDMS soft molds." @default.
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• W1991753814 date "2010-11-01" @default.
• W1991753814 modified "2023-10-18" @default.
• W1991753814 title "UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer" @default.
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• W1991753814 doi "https://doi.org/10.1016/j.mee.2010.04.016" @default.
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