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- W1991758977 abstract "Germanium thin films electrochemically deposited at 300 K from a solution of GeCl4 in propylene glycol were investigated using X-ray diffraction (XRD), infrared (IR) spectroscopy and atomic force microscopy (AFM). XRD reveals that the germanium electrodeposits are of crystalline structure and have the preferred crystallographic growth orientation [2 2 0]. The presence of the hydrogen bonding in the germanium films such as Ge–H and Ge–H2 is shown from the IR absorption and does not cause a phase transition from crystalline structures to amorphous structures. The AFM images exhibit anomalous surface roughening behaviors in growth that deviate from statistical surface growth models and indicate a transition from rough surfaces to smooth surfaces." @default.
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- W1991758977 date "2003-01-01" @default.
- W1991758977 modified "2023-10-01" @default.
- W1991758977 title "Evaluation of crystalline germanium thin films electrodeposited on copper substrates from propylene glycol electrolyte" @default.
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- W1991758977 doi "https://doi.org/10.1016/s0257-8972(02)00576-5" @default.
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