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• W1991769504 abstract "Investigations by means of x-ray photoelectron spectrometry, electron probe microanalysis, x-ray fluorescence analysis, imaging x-ray fluorescence analysis, x-ray diffraction and secondary ion mass spectrometry were performed to quantify thin GexCyOz: H films. The films were prepared by r.f. plasma deposition of tetraethylgermanium in a parallel-plate system and in a two-rod discharge system with magnetron enhancement. The results of these investigations indicated that depth profiling delivers a homogeneous composition, with the exception of the outermost surface. At a constant flow-rate of tetraethylgermanium, the film density and the Ge/C atomic ration increase with increasing r.f. power density towards a maximum of 3.5 g cm−3 and 0.5, respectively. The hydrogen content does not change significantly. At low r.f. power densities there is a considerable increase in oxygen. There is no evidence for crystalline germanium carbide. Magnetron enhancement causes an increasing deposition rate and an inhomogeneous deposition in the lateral direction of the films." @default.
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• W1991769504 date "1992-05-01" @default.
• W1991769504 modified "2023-09-24" @default.
• W1991769504 title "X-ray analysis of thin GexCyOz: H films" @default.
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• W1991769504 doi "https://doi.org/10.1002/xrs.1300210308" @default.
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