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- W1992023162 abstract "Dual work function metal gates fabricated by full silicidation of a Co–Ni bilayer with different Co:Ni ratios were investigated by both physical and electrical measurements. Full silicidation, sheet resistance and phase confirmation of CoxNi1−xSi2 were studied by physical characterizations. Complementary metal-oxide-semiconductor work functions were extrapolated by electrical characterization and correlated with dopant accumulation at the gate/oxide interface. The quality of underlying oxide was measured by gate leakage current density and found to be impacted by the Co:Ni ratio in CoxNi1−xSi2." @default.
- W1992023162 created "2016-06-24" @default.
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- W1992023162 date "2006-01-30" @default.
- W1992023162 modified "2023-10-17" @default.
- W1992023162 title "Phase formation and work function tuning in fully silicided Co–Ni metal gates with variable Co:Ni ratios" @default.
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- W1992023162 doi "https://doi.org/10.1063/1.2167799" @default.
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