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• W1992116811 abstract "The interaction of hydrogen at GaAs(100) surfaces has been studied at 300 and 200 K by means of high-resolution electron energy-loss spectroscopy (HREELS), low energy electron diffraction (LEED) and Auger electron spectroscopy (AES). Sample cleaning was done by Ne + ion bombardment (500 eV) and annealing up to 800 K. As a function of hydrogen exposure, in a first stage atomic hydrogen chemisorbs by saturating surface atom dangling bonds. In a second step surface bonds are broken and a change of the geometrical structure results. Finally, higher hydrogen exposures are able to etch GaAs. At room temperature, with increasing hydrogen exposure always a decrease of the concentration of arsenic hydrides occurs relative to that of gallium hydrides, a conclusion drawn from the intensity behaviour of the As-H and Ga-H stretching vibrations. Simultaneously, we observed structure changes from c(8 × 2) or 4 × 6 to 4 × 1, 1 × 1, and 1 × 2. At lower temperatures (200 K) , the arsenic hydrides are more stable than at 300 K. Our results can be interpreted in terms of dimerization, bond breaking, surface diffusion and eventually roughening." @default.
• W1992116811 created "2016-06-24" @default.
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• W1992116811 date "1991-07-01" @default.
• W1992116811 modified "2023-09-27" @default.
• W1992116811 title "Interaction of hydrogen at GaAs(100) surfaces" @default.
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• W1992116811 doi "https://doi.org/10.1016/0039-6028(91)91140-s" @default.
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