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- W1992164847 abstract "Abstract The electrical characteristics of films of Al 2 O 3 prepared by anodizing aluminium substrates were investigated. The Al 2 O 3 consisted of a thin barrier layer of approximate thickness 150–180 A surmounted by a thick porous layer of thickness 5–10 μm. Cobalt ions were deposited in the lower sections of the porous layer by a method of metal pigmentation. A number of different conduction processes were observed, including Schottky-type behaviour, field ion diffusion, space-charge-limited currents, ohmic conductivity and also electroforming and electron emission. A typical barrier height ∅ for Schottky emission at the AlAl 2 O 3 interface of 1.11 eV was calculated, and an activation energy E = 0.50−0.68 eV was estimated for the space-charge-limited process. The observation of electroforming in samples of such thickness was ascribed to the field-induced growth of conducting filaments in regions of the porous material which had previously been destroyed by excess heat dissipation." @default.
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- W1992164847 date "1978-06-01" @default.
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- W1992164847 title "The electrical characteristics of porous Al2O3 produced by anodization" @default.
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- W1992164847 doi "https://doi.org/10.1016/0040-6090(78)90359-0" @default.
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