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• W1992395736 abstract "The low-temperature electrical transport behavior of amorphous ${mathrm{Re}}_{x}{mathrm{Si}}_{1ensuremath{-}x}$ and ${mathrm{Re}}_{x}{mathrm{Fe}}_{y}{mathrm{Si}}_{1ensuremath{-}xensuremath{-}y}$ thin films has been investigated as a function of temperature and magnetic field on the metallic side of the metal-insulator transition (MIT). In the temperature range above 20 K both undoped and Fe-doped films show the same approximately linear behavior of conductivity up to 300 K. At temperatures below 20 K the conductivity of the ${mathrm{Re}}_{x}{mathrm{Si}}_{1ensuremath{-}x}$ system can be understood on the basis of the theory of quantum corrections to the conductivity: The temperature dependence of the conductivity and the negative magnetoconductivity are caused by electron-electron interactions. The conductivity of Fe-doped films shows a completely different behavior. The comparison of undoped and Fe-doped films at the same ensuremath{sigma}(0) demonstrates that the width of the density of states anomaly near the Fermi energy ensuremath{Delta} differs by two orders of magnitude. The positive contribution to the magnetoconductivity increasing strongly with decreasing temperature can be explained within a model of bound magnetic polarons and is related to additional spin scattering." @default.
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• W1992395736 date "2003-01-13" @default.
• W1992395736 modified "2023-09-26" @default.
• W1992395736 title "Electrical and magnetoconductivity of binary and Fe-dopeda−RexSi1−xthin films near the metal-insulator transition" @default.
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• W1992395736 doi "https://doi.org/10.1103/physrevb.67.035302" @default.
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