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- W1992594816 abstract "New negative photoresists, called MRS-type resists, are successfully applied to deep-UV 1:1 projection printing and 365 nm 10:1 reduction projection printing. The MRS-type resists are characterized by intense absorption of exposure light and absence of swelling in aqueous developer solutions. They resolve steep profile submicron images in a 1.0 μ thick film. They are not adversely affected by reflected light from water surfaces. In order to use MRS-type resists with broader development latitude, optimizing the extent of light absorption is important because the resist profiles strongly depend on development conditions due to increasing solubility towards the resist bottom." @default.
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- W1992594816 date "1983-11-01" @default.
- W1992594816 modified "2023-09-27" @default.
- W1992594816 title "Shorter-wavelength lithography utilizing MRS-type negative resists" @default.
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- W1992594816 doi "https://doi.org/10.1016/0167-9317(83)90002-3" @default.
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