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- W1992725870 abstract "The interstitial in Si and Ge is investigated theoretically by using the extended perturbation theory in pseudopotential formalism developed by two of the authors (A.M. and T.S.). It is shown that the interstitial is most stable at the hexagonal site and its diffusion path is hexagonal→tetrahedral→hexagonal. The calculated migration energy of the interstitial is 0.18 eV for Si and 0.09 eV for Ge." @default.
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- W1992725870 date "1973-07-01" @default.
- W1992725870 modified "2023-10-16" @default.
- W1992725870 title "Calculation of the Migration Energy of the Interstitial in Si and Ge" @default.
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- W1992725870 doi "https://doi.org/10.1143/jpsj.35.146" @default.
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