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- W1993072885 abstract "Atomic layer epitaxy (ALE) was used to grow several components of the cascade solar cell structure in the AlGaAs/GaAs system. An ALE reactor was constructed for multiwafer growth with a growth rate of 0.6 μm h−1. Device quality GaAs and AsxGa1−xAs films were grown with p-type background carbon doping in the ranges 1015–1019 cm−3 and 1016–1020 cm−3 respectively. N-type films were achieved by SiH4 doping, producing carrier concentrations in the range 1016–1018 cm−3. In addition, the potential applications of the ALE technique in the photovoltaic field are discussed." @default.
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- W1993072885 date "1991-05-01" @default.
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- W1993072885 title "Materials aspects of multijunction solar cells" @default.
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- W1993072885 doi "https://doi.org/10.1016/0379-6787(91)90063-u" @default.
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