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- W1993278322 abstract "The long-term charge loss characteristic in a floating-gate EPROM cell with an oxide-nitride-oxide (ONO) interpoly stacked dielectric has been studied quantitatively. It is found that trapped electrons at the nitride-oxide interface can directly tunnel through a thin approximately 30-AA top oxide. The estimated tunneling barrier height is about 2.6 eV, which is consistent with the previous result based on MNOS studies. The thermal activation of the long-term charge loss is believed to be caused by the availability of trapped electrons at the top oxide-nitride interface. The thermal activation energy of the long-term charge loss is about 0.37 eV, which is similar to the activation energy of the second phase. It is believed that the trapped electron density at the top oxide-nitride interface becomes larger at higher temperatures due to the activated electron movement during the second phase.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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- W1993278322 date "1991-02-01" @default.
- W1993278322 modified "2023-09-24" @default.
- W1993278322 title "Physical origin of long-term charge loss in floating-gate EPROM with an interpoly oxide-nitride-oxide stacked dielectric" @default.
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- W1993278322 doi "https://doi.org/10.1109/55.75700" @default.
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