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- W1993292375 abstract "Abstract Schottky barrier diodes have been made by evaporating semitransparent filmsof various metals (Ag, Au, Sc, Sm, Y, Yb) onto p-type hydrogenated amorphous silicon (a-Si:H) prepared by the glow discharge decomposition of SiH4−B2H6 mixtures. Good diode characteristics have been obtained with low work function metals such as Y and Yb. Barrier heights φb are close to 1 eV and diode quality factors n ∼ 1.3 . The photo-response of these diodes has been measured and analysed to determine the μτ-product of the minority carriers (electrons). We find μτ ≈ 10 −9 cm2/V which is very similar to the μτ-product of holes in comparable Schottky barrier diodes of n-type a-Si:H." @default.
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- W1993292375 date "1982-09-01" @default.
- W1993292375 modified "2023-09-27" @default.
- W1993292375 title "Schottky barriers on p-type a-Si:H" @default.
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- W1993292375 doi "https://doi.org/10.1016/0165-1633(82)90088-0" @default.
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