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• W1993359840 abstract "In this experiment, a new deposition technique was employed to deposit and to dope the amorphous carbon (a-C). Nitrogen doped amorphous carbon (a-C: N) thin films were prepared by Aerosol-assisted Chemical Vapor Deposition (AACVD) by varying the deposition time from 15 minutes to 60 minutes. The electrical and optical properties of deposited a-C: N thin films were characterized by current-voltage Solar Simulator system and UV-Vis-NIR spectroscope. Electrical characterization results in ohmic behavior with the optimum conductivity were indicated at sample deposited for 15 minutes. At visible range, the transmittance is high (above 80%) for sample deposited at 15 minutes and possess lower transmittance (60% to 85%) when deposition time increase up to 45 minutes. The absorption coefficient, α for a-C: N is reported to be ∼x105 cm−1. From the atomic force microscope characterization, surface morphology and roughness value was measured." @default.
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• W1993359840 date "2012-09-01" @default.
• W1993359840 modified "2023-09-26" @default.
• W1993359840 title "Properties of amorphous carbon thin films with nitrogen incorporation by Aerosol-assisted CVD" @default.
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• W1993359840 doi "https://doi.org/10.1109/smelec.2012.6417089" @default.
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