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• W1993557418 abstract "Hard diamond-like carbon films were deposited on Si(100) substrates using a CH4 plasma created through electron cyclotron resonance (ECR) heating. The ECR plasma was excited by a Lisitano coil. These films could be deposited with a negative dc bias (−200 V) or a rf-induced negative self-bias (−100 V) on the substrates. The deposition rate of the film was about 2.3 Å/s. The deposited films were characterized by Raman spectroscopy and near-edge x-ray absorption fine structure analysis." @default.
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• W1993557418 date "1991-11-11" @default.
• W1993557418 modified "2023-09-25" @default.
• W1993557418 title "Deposition of diamond-like carbon film using electron cyclotron resonance plasma" @default.
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• W1993557418 doi "https://doi.org/10.1063/1.105943" @default.
• W1993557418 hasPublicationYear "1991" @default.
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