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• W1993786107 abstract "ZrxCu100−x amorphous films are prepared on Si (111) substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability (GFA) of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x = 65. It is therefore different from the bulk counterparts, for which only x = 35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure." @default.
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• W1993786107 date "2009-08-01" @default.
• W1993786107 modified "2023-10-16" @default.
• W1993786107 title "Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu" @default.
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• W1993786107 doi "https://doi.org/10.1088/0256-307x/26/8/086109" @default.
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