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- W1993797815 abstract "Imaging experiments in 5nm and 13nm soft X-ray projection lithography (SXPL) were performed using two separate 32:1 reduction Schwarzschild optics with a Ni/CrC multilayer and a Mo/Si multilayer, respectively. The optics were illuminated with synchrotron radiation (SR) light source from the SORTEC ring. Sensitivities of [email protected] PMMA and ZEP are 285 and 34mJ/cm^2 at 5nm and those of [email protected] PMMA and ZEP are 134 and 38mJ/cm^2 at 13nm. Resist contrasts (@c-values) of [email protected] PMMA and ZEP are 2.5 and 1.6 at 5nm, and those of [email protected] PMMA and ZEP are 1.8 and 1.4 at 13nm. A [email protected] pattern can be replicated by 13nm exposure, while only just a [email protected] pattern can be replicated by 5nm exposure. The high resolution of [email protected] at 13nm is limited by diffraction, while that of [email protected] at 5nm is limited by the wavefront error of the multilayer-coated optics." @default.
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- W1993797815 date "1995-02-01" @default.
- W1993797815 modified "2023-09-26" @default.
- W1993797815 title "Resist performance in 5nm and 13nm soft X-ray projection lithography" @default.
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- W1993797815 doi "https://doi.org/10.1016/0167-9317(94)00115-b" @default.
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