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- W1993855146 abstract "A four-inch curved-crystal spectrometer has been used to investigate the internal resonance Raman scattering (IRRS) process in Si $K$ x-ray spectra induced by 1.5- and 2.0-MeV proton bombardment of thick targets. The IRRS process involves the scattering of characteristic target $K{ensuremath{alpha}}_{1,2}$ radiation off of the $L$ shell of a neighboring target atom. The scattered photons exhibit an edge-shaped structure at ensuremath{sim} 1640.5 eV which tails off at low energies. A thick-target analysis has been used to obtain a partial scattering cross section for scattering within the observable energy range $1634ensuremath{le}{E}_{f}ensuremath{le}1640.5$ eV, which is in reasonable agreement with our calculations based on second-order perturbation theory. Based on the partial cross section, we are able to estimate the total IRRS cross section for scattering into all angles and all allowed energies ($0ensuremath{le}{E}_{f}ensuremath{le}1640.5$ eV) to be $(58ifmmodepmelsetextpmfi{}20){r}_{0}^{2}$ or (4.6ifmmodepmelsetextpmfi{}1.6)${10}^{ensuremath{-}24}$ ${mathrm{cm}}^{2}$." @default.
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- W1993855146 date "1979-02-01" @default.
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- W1993855146 title "Internal resonance Raman scattering of characteristic targetKx rays in thick silicon targets" @default.
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- W1993855146 doi "https://doi.org/10.1103/physreva.19.568" @default.
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