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- W1993906384 abstract "The details of the underpotential deposition (UPD) of Cu on Pt(111) in the presence of Cl− were re-examined using a combination of familiar ex-situ techniques (AES/LEED and new in-situ techniques, anomalous surface X-ray scattering (SXS) and Cu2+ flux measurements using a rotating ring disk configuration with the Pt(111) single crystal as the disk electrode. In combination these techniques show definitively that Cu UPD occurs in a two step process, the first being the formation of a CuCl adlattice having a bi-layer structure similar to the (111) plane of CuCl, the second being the formation of a pseudomorphic Cu monolayer covered with a Cl adlayer. The latter appears to have a structure similar to the structure of Cl adsorbed on Cu(111) to saturation in UHV." @default.
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- W1993906384 date "1995-07-01" @default.
- W1993906384 modified "2023-10-10" @default.
- W1993906384 title "The effect of chloride on the underpotential deposition of copper on Pt(111): AES, LEED, RRDE, and X-ray scattering studies" @default.
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- W1993906384 doi "https://doi.org/10.1016/0039-6028(95)00452-1" @default.
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