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• W1993923771 abstract "Multilayered ZnO:Al and ZnO:Ov film was prepared by alternately sputtering ZnO:Al(2% wt.) and Zn targets. The films obtained were optically transparent and had lower resistivity than those prepared by ZnO:Al sputtering. Deposition from the Zn target gave a ZnO film containing native donors (a ZnO:Ov film). The carrier concentration increased in the ZnO:Al/ZnO:Ov multilayered film. Our results cannot be explained by the redistribution of the carrier between ZnO:Al and ZnO:Ov. This result indicates an improvement in the doping efficiency. Multilayered films of ZnO:Al and Al oxide compounds were also prepared. In this case, with increasing thickness of the Al oxide film, a decrease was observed in the carrier mobility, due to the scattering at the interface." @default.
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• W1993923771 date "1998-12-01" @default.
• W1993923771 modified "2023-10-01" @default.
• W1993923771 title "Transparent conductive ZnO film preparation by alternating sputtering of ZnO:Al and Zn or Al targets" @default.
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• W1993923771 doi "https://doi.org/10.1016/s0040-6090(98)01112-2" @default.
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