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- W1994019804 abstract "Abstract Heterostructures consisting of an InGaSb quantum well situated between AlGaSb barriers were grown by molecular beam epitaxy. Calculations indicate a type-I band structure with substantial valence and conduction band offsets that can allow for the confinement of either electrons or holes in the InGaSb. Quantum wells with n-type conduction were achieved using modulation doping, with Te located in the barrier above the quantum well. A set of barrier layers was found which resulted in a sample with an In 0.2 Ga 0.8 Sb quantum well that exhibited an electron mobility of 3900 cm 2 /V s as grown. After removal of upper barrier layers including the Te by selective etching, the conductivity switched to p-type, with hole mobilities near 800 cm 2 /V s. This design could allow the integration of low-power n- and p-channel field-effect transistors for complementary logic applications." @default.
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- W1994019804 date "2009-12-01" @default.
- W1994019804 modified "2023-09-24" @default.
- W1994019804 title "Demonstration of high-mobility electron and hole transport in a single InGaSb well for complementary circuits" @default.
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- W1994019804 doi "https://doi.org/10.1016/j.jcrysgro.2009.09.047" @default.
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