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- W1994137250 abstract "Polyhedral Oligomeric Silsesquioxane (POSS) derivatives have been investigated as potential candidates for high resolution resists. POSS materials are cage compounds with defined mono-disperse molecular weights. These materials are attractive candidates for molecular resist development because of their commercial availability and the ease with which they can be derivatized. These resists are more suited for bilayer resist applications because of their high silicon content. We have developed positive bilayer resists suitable for 193-nm and other emerging lithographic applications." @default.
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- W1994137250 date "2005-05-04" @default.
- W1994137250 modified "2023-09-27" @default.
- W1994137250 title "Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)" @default.
- W1994137250 doi "https://doi.org/10.1117/12.600615" @default.
- W1994137250 hasPublicationYear "2005" @default.
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