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• W1994248061 abstract "Multi-beam laser interference lithography (MB-LIL) is a rapid and cost-effective maskless optical lithography technique to parallelly pattern periodic or quasi- periodic micro/nano-structured material over large areas more than square centimetres. An interference pattern between two or more coherent laser beams is set up and recorded in a recording material of substrate. This interference pattern consists of a periodic series of geometries representing intensity minima and maxima. The patterns that can be formed depend on the number and configuration of laser beams. This review introduces the development and application of MB-LIL system for fabrication of micro/nano-structured material. At first, it surveys various types of MB-LIL methods by classifying different beam configurations. Then the paper shows some application results for fabrication 2D/3D micro/nano structure arrays by means of interference patterns with multi-exposed or directly ablation technique. The patterend micro/nano-structure arrays include crossed diffraction grating array in photoresist, 3D pattern in polymetric photonic crystals, and magnetic nanoarrays in thin film. Finally, an innovative four-beam LIL system is introduced, which is being developed within the EC-granted project DELILA." @default.
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• W1994248061 date "2007-05-18" @default.
• W1994248061 modified "2023-10-16" @default.
• W1994248061 title "Current developments and applications using multi-beam laser interference lithography for nanoscale structuring of materials" @default.
• W1994248061 doi "https://doi.org/10.1117/12.723620" @default.
• W1994248061 hasPublicationYear "2007" @default.
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