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- W1994295967 abstract "Abstract The kinetics of atomic hydrogen isothermal adsorption and desorption on a Si(1 0 0) surface was studied using the time-of-flight scattering and recoiling spectrometry technique at temperatures below and above the thermal desorption threshold. A continuous decrease in saturation coverage with temperature under constant atomic hydrogen exposure has been observed in both regions for temperatures in the range 325–820 K. For T S =500–650 K, the decrease is described by a kinetic model where Eley–Rideal (ER) abstraction is responsible for hydrogen removal from the surface and hydrogen coverage depends on the temperature due to the changing rate of migration from precursor to primary monohydride sites. For T S =650 K and higher, in addition to the ER abstraction, the thermal desorption from primary monohydride sites leads to a further decrease of the saturation coverage. The first-order desorption rates after source shut-off have been measured and an activation barrier of 1.89 eV has been obtained." @default.
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- W1994295967 date "2004-03-01" @default.
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- W1994295967 title "TOF-SARS study of hydrogen adsorption and desorption kinetics on Si(100)" @default.
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- W1994295967 doi "https://doi.org/10.1016/j.vacuum.2003.12.027" @default.
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