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- W1994361061 abstract "We report the gas-phase photochlorination of methyl-terminated alkyl monolayers on silicon. We argue that this process proceeds by a free-radical mechanism, as is the case for homogeneous photochlorination. This is an example of what should be a family of convenient methods for the incorporation of various functional groups into simple alkyl monolayers by chlorine-radical activation. Monolayers prepared from 1-octadecene on Si(111) were exposed to Cl2 with illumination at 350 nm. We observe that a fraction of the carbon atoms on the surface become singly chlorinated and a smaller fraction become doubly chlorinated, as measured by the chemically shifted components of the C 1s X-ray photoelectron spectrum. The elemental composition of the resulting monolayers, film thickness, and contact angles are reported as a function of exposure. Under conditions that chlorinate only a fraction of the carbon atoms, IR spectroscopy reveals complete chlorination of the methyl groups, demonstrating a strong steric preference for chlorination at the ends of the alkyl chains. In the absence of illumination, a much slower dark reaction is observed." @default.
- W1994361061 created "2016-06-24" @default.
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- W1994361061 date "2002-07-16" @default.
- W1994361061 modified "2023-09-27" @default.
- W1994361061 title "Surface Functionalization of Alkyl Monolayers by Free-Radical Activation: Gas-Phase Photochlorination with Cl<sub>2</sub>" @default.
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- W1994361061 doi "https://doi.org/10.1021/la020095d" @default.
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