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- W1994450559 abstract "Fabrication of nanometre-scale structures in short timescales and with high throughput has great importance in the future of nanoscale science and technology. We show that the local oxidation of hydrogen-passivated silicon surfaces by intermittent-contact mode atomic force microscopy can be applied on timescales as low as 500 ns to create single oxide nanostructures with dimensions of 0.6×15 nm2. Furthermore, we report on preliminary experiments demonstrating that local oxidation can also be achieved with relative tip-sample speeds in excess of 2 cm s−1 in order to pattern larger areas. This was realised using a high-speed scan stage based on a quartz crystal resonator operating at 20 kHz." @default.
- W1994450559 created "2016-06-24" @default.
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- W1994450559 date "2008-09-01" @default.
- W1994450559 modified "2023-09-29" @default.
- W1994450559 title "Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds" @default.
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- W1994450559 doi "https://doi.org/10.1016/j.ultramic.2008.04.061" @default.
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