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- W1994522887 abstract "Interest in the use of LiNbO/sub 3/ thin films for piezoelectric and optical applications has increased. However it has been very difficult to prepare high-quality LiNbO/sub 3/ films. In order to improve the quality, LiNbO/sub 3/ films were prepared by bias sputtering, and the effects of bias electric field during the LiNbO/sub 3/ sputtering deposition were investigated. The deposition rate and Li/Nb composition of obtained films were greatly influenced by the bias field applied externally. The relationship between the bias voltage, the deposition rate and the composition was evaluated, revealing that both the rate and Li composition of the films were decreased at negative bias voltage. The oriented LiNbO/sub 3/ films on SiO/sub 2//Si substrates may show fine piezoelectric and electric properties. However it has been very hard to grow oriented LiNbO/sub 3/ films on SiO/sub 2/. C-axis oriented LiNbO/sub 3/ films were successfully obtained on SiO/sub 2//Si by bias sputtering. The as-grown oriented films also showed pyroelectricity. It was revealed that bias sputtering was very useful in the improvement of the crystallinity of LiNbO/sub 3/ films." @default.
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- W1994522887 date "2002-11-28" @default.
- W1994522887 modified "2023-09-26" @default.
- W1994522887 title "Growth of LiNbO/sub 3/ thin films by bias sputtering" @default.
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- W1994522887 doi "https://doi.org/10.1109/isaf.1998.786698" @default.
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