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- W1994906114 abstract "Breakdown voltages and concentration profiles of p-n junctions produced by deep diffusion of boron into silicon single crystals have been investigated. It was found that at temperatures approaching the melting point of silicon there is a distinct deviation of the concentration profiles from the theoretical erfc. Also in the range of temperatures 1330–1350°C the junctions produced are unstable and deteriorate by heat treatment. Les voltages de rupture et les profils de concentration des jonctions p-n produits pas la diffusion en profondeur du boron dans des monocristaux de silicon ont été étudies. Il s'avere qu'aux températures voisines de celle de la fusion du silicon, existe une deviation des profils de concentration distincte de erfc théoriques. De même, il s'avere que dans l'interval des températures 1330–1350°C, les jonctions produites sont instables et se détériorent par traitement de chaleur." @default.
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- W1994906114 date "1965-01-01" @default.
- W1994906114 modified "2023-10-17" @default.
- W1994906114 title "Deep diffusion of boron into silicon single crystals" @default.
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- W1994906114 doi "https://doi.org/10.1016/0038-1098(65)90160-2" @default.
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