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• W1994911503 abstract "Abstract The deposition of low refractive index AlOxFy films by d.c. reactive sputtering in an Ar+O2+CF4 atmosphere was analyzed. The composition and refractive index of the films depended on the deposition parameters: gas composition and cathode current. The deposition mechanism of AlOxFy and control of its composition are discussed. The refractive indices of AlOF2 and AlF3 were determined." @default.
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• W1994911503 date "1991-04-01" @default.
• W1994911503 modified "2023-09-27" @default.
• W1994911503 title "Deposition of AlOxFy films using d.c. reactive sputtering" @default.
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• W1994911503 doi "https://doi.org/10.1016/0040-6090(91)90010-u" @default.
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