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• W1995305439 startingPage "171" @default.
• W1995305439 abstract "Nanocrystalline diamond (NCD) films were grown on silicon substrates by hot filament chemical vapor deposition in Ar/N2/CH4 gas mixtures. The effects of seeding process prior to deposition, the total gas pressure, and concentration of nitrogen on the grain size, morphology and bonding nature in HFCVD technique were investigated. The results indicated that a low total gas pressure is favorable for nanosized diamond crystallites. Films micrograph obtained from scanning electron microscopy showed diamond nanograins elongated with the addition of nitrogen in the plasma. Crystal structure investigations were carried out by X-ray diffraction measurements for deposited films. An increase in the size of crystallite is also observed from XRD measurements in NCD film when nitrogen was added in plasma. From Raman spectra, it was observed that the relative intensity of G peak increases indicating more graphite content after nitrogen added in the plasma. The effects of the nitrogen incorporation in nanocrystalline films in HFCVD are discussed." @default.
• W1995305439 created "2016-06-24" @default.
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• W1995305439 date "2010-01-01" @default.
• W1995305439 modified "2023-10-05" @default.
• W1995305439 title "Effects of N2 addition on nanocrystalline diamond films by HFCVD in Ar/CH4 gas mixture" @default.
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• W1995305439 doi "https://doi.org/10.1016/j.cap.2009.05.014" @default.
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