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• W1995362112 abstract "Nano-crystalline diamond films were successfully deposited using CH4/H2/Ar gas mixture by hot filament chemical vapor deposition (HFCVD) method. The characterizations of the as-grown films are carried out by using field emission scanning electron microscopy (FE-SEM) and high-resolution transmission electron microscopy (HR-TEM). The results show that the film consists of nano-crystalline diamond grains with sizes ranging from 4 to 30 nm. High renucleation rates are found and attributed to the formation of these nano-diamond grains. The roles that Ar plays in HFCVD system are discussed." @default.
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• W1995362112 date "2001-08-01" @default.
• W1995362112 modified "2023-10-02" @default.
• W1995362112 title "The roles of argon addition in the hot filament chemical vapor deposition system" @default.
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• W1995362112 doi "https://doi.org/10.1016/s0925-9635(01)00383-1" @default.
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