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• W1995788934 abstract "In order to improve the functional properties of hard coatings, recent investigations have been directed towards Ti–N based multicomponent materials. The nitride (Ti, Al)N, in particular, with a Ti:Al ratio of 1:1 seems to be a promising alternative to the widely used TiN, exhibits better oxidation resistance and hence improved performance over that of TiN. (Ti, Al)N coatings were dc sputter deposited onto 316SS substrates under ambient and liquid nitrogen temperatures. As deposited films were oxidized in a vertical fused-silica tube furnace in pure O2 flowing atmosphere at temperatures ranging from 700 to 900 °C. Scanning electron microscope and atomic force microscope images reveal information about the particle size and film thickness. X-ray photoelectron spectroscopy was employed to study the chemistry of the top few atomic layers in addition to compositional analysis and information on the details of chemical bonding. The difference in film stoichiometry are compared at two different deposition conditions thus reflecting their behavior under oxidizing conditions." @default.
• W1995788934 created "2016-06-24" @default.
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• W1995788934 date "2000-07-01" @default.
• W1995788934 modified "2023-10-14" @default.
• W1995788934 title "Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid N2 temperatures" @default.
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• W1995788934 doi "https://doi.org/10.1116/1.582387" @default.
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