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- W1996040905 abstract "We had developed an attenuated phase shift mask for DUV exposure (DUV- AttPSM) using a CrFx film as a phase shifting layer. But the durability against DUV irradiation was poor (ca. 0.8% transmittance increase after 37 kJ/cm<SUP>2</SUP>). In addition, an exposure test proved that the phase shift angle of the DUV-AttPSM was 170 degrees. We improved the durability against DUV irradiation of our DUV-AttPSM by changing the deposition conditions. The transmittance change after 37 kJ/cm<SUP>2</SUP> irradiation is reduced to 0.15%. The improved film shows acceptable durability against chemicals, and there is no problem in the mask- cleaning process. Furthermore, we evaluated the exposure properties of a DUV-AttPSM with a phase-shift angle of ca. 180 degrees, and the focus latitude for a 0.25 micrometers hole array turns out to be 2.5 micrometers , being 5- times as large as that of a binary mask. In addition, the consecutive deposition stability of the blank was tested, and the DUV-AttPSM proved to be adaptable to mass production." @default.
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- W1996040905 date "1995-07-03" @default.
- W1996040905 modified "2023-09-23" @default.
- W1996040905 title "Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure" @default.
- W1996040905 doi "https://doi.org/10.1117/12.212782" @default.
- W1996040905 hasPublicationYear "1995" @default.
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